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Phys_org
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Accelerating 3D nanofabrication using a sensitive cationic photoresist
Two-photon laser direct writing lithography or TPL is a cutting-edge technique used for creating nanoscale structures. It works by leveraging specific materials known as photoresists, which change their chemical properties when exposed to light. These materials absorb laser light in a unique way, enabling precise control during exposure to laser beams. ⌘ Read more